DC Magnetrons are the most common power supplies for depositing metals. DC Pulsed  power supplies work well on both dialectrics and metals.

DC resistance power supplies for resistance heating must be matched to the surface area and resistnace of the heating element.

RF Power Supplies

RF power supplies are for RF sputtering, RF Bias, RF Etch/ashing and induction heating. RF sputtering supplies are frequently set at 13.56 MHz.. Many used RF power supplies are solid state; however tube types are still available. RF DC Power ranges from 100 W to 200 kW for solid state supplies and tube supplies can go to 100 kW.

 Some applications require low frequency power supplies. Most run from 50 to 460 kHz. Induction heating RF  power supplies arecommon.

Electron-Beam  [E-Beam] Power Supplies and Guns

E-beam power supplies are high voltage DC power supplies which are used in conjunction with an Electon-beam guns primarily used  for evaporation of materials. The most common used E beam supplies  range in power from two to 15 kW and run at voltages between 4 and 15 kV.

Many e beam supplies are equipped with a beam sweep which moves the beam in the pocket to distribute power evenly across the pocket. Sweeps are normally used for the evaporation of non-conductive materials.

All e beam power supplies should have  interlocks for high voltage safety,

An interface is needed for  control from a deposition monitor/controller. Some power supplies can run more than one gun or system. E-beam guns are water cooled. Multi-pocket guns come in 4- or 6-pocket configurations and range in pocket size from 5 to 30 ccs.  The typical  maximum power for a multi-pocket e-gun is 10 kW.